NOVELTY – Silica glass production involves obtaining porous silica by depositing silica nanoparticles, which are produced by flame hydrolysis and oxidation reactions of gaseous compounds of silicon. The porous silica material is processed at 1300-1500 degrees C. USE – Method for producing silica glass used for producing optical components and used in optical lithography in UV region (all claimed). ADVANTAGE – The method enables to produce the silica glass product with high homogeneity of refractive index.
L01 (Glass – includes chemical compositions, batch treatment, furnaces, flat glass forming, hollow-ware forming, postforming and glass/ceramics, but not lens designs, bottling, bottle-washing, closures for containers, glazing designs, glass cutting, chamfering edges, printing on glass, disposing of used glass or the production of pure sodium silicate. Chemical aspects of optical fibres (C03).)