NOVELTY – Apparatus comprises an electric power source (1), a temperature gauge (2), a valve (3), an upper flange sealing chamber (4), a pressure gauge (6), a lower flange sealing chamber (7) and a suction pump gas (8). USE – Apparatus for hot-filament chemical vapor deposition (HFCVD) of uniform and homogeneous diamond films on tubular or conical substrates (claimed). ADVANTAGE – The apparatus enables to adhere diamond films on tubular or conical substrates efficiently. DESCRIPTION OF DRAWING(S) – The drawing shows a schematic view of the apparatus. Electric power source (1) Temperature gauge (2) Valve (3) Upper flange sealing chamber (4) Pressure gauge (6) Lower flange sealing chamber (7) Suction pump gas (8)
M13 (Coating material with metals, diffusion processes, enamelling and vitreous coatings – including coating from liquid metal or solution, spraying, cementation, cathodic sputtering, enamelling and oilfree lubricant coatings, but not coatings for the production of semiconductors (C23C, D).); S02 (Engineering Instrumentation)