Chemical vapor deposition reactor used for the production of ultrapure carbon, comprises flanges, camera, coils, input tube, exhaustion pipe, collector, temperature regulator and door substrate

Backlog Química Tecnologia de superfície, Revestimento

Chemical vapor deposition reactor used for the production of ultrapure carbon, comprises flanges, camera, coils, input tube, exhaustion pipe, collector, temperature regulator and door substrate

NOVELTY – Chemical vapor deposition reactor comprises flanges (1), camera (2), coils (3), input tube (4), exhaustion pipe (5), collector (6), temperature regulator (7) and door substrate (8). The two ends of the flanges is set with camera. The insulating material is filled by a refrigerant and gasses. USE – Chemical vapor deposition reactor used for the production of ultrapure carbon. DESCRIPTION OF DRAWING(S) – The drawing shows a schematic view of a chemical vapor deposition reactor. Flanges (1) Camera (2) Coils (3) Input tube (4) Exhaustion pipe (5) Collector (6) Temperature regulator (7) Door substrate (8)

Main Application Field

M13 (Coating material with metals, diffusion processes, enamelling and vitreous coatings – including coating from liquid metal or solution, spraying, cementation, cathodic sputtering, enamelling and oilfree lubricant coatings, but not coatings for the production of semiconductors (C23C, D).)

INVENTORS:

PETERLEVITZ ALFREDO CARLOS
ZANIN HUDSON GIOVANI
BARANAUSKAS VITOR
SANERIP WAGNER

720_CVD

Patent number: BR102013032728-A2

PATENT STATUS:

For information contact Inova Unicamp

FOR ADDITIONAL INFORMATION:

parcerias@inova.unicamp.br

+55 (19) 3521-5207 / 2607

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